Iwaki MDM326EKK10 MDM Series Magnetic Drive Chemical Process Pump
This Iwaki MDM326EKK10 is a high-performance magnetic drive chemical process pump engineered for demanding industrial fluid handling applications. Designed with a carbon fiber reinforced ETFE casing and impeller, this seal-less centrifugal pump delivers exceptional corrosion resistance and leak-free operation for aggressive chemicals and high-purity fluids. Its magnetic drive construction eliminates conventional mechanical seals, reducing maintenance requirements and minimizing the risk of fluid leakage.
Built for reliability in chemical processing environments, the MDM326EKK10 features durable silicon carbide bearings and shaft components for enhanced wear resistance and long service life. The pump is designed for heavy-duty process applications requiring consistent flow, chemical compatibility, and dependable operation. Its ANSI flanged 3-inch suction and 2-inch discharge ports support efficient integration into industrial process systems.
The less motor configuration allows users to pair the pump with a compatible motor based on specific operational requirements. With dry-run resistance capabilities and advanced fluororesin construction, the Iwaki MDM series is widely trusted in chemical transfer, recirculation, and industrial process applications where safety and durability are critical.
Key Features
- Magnetic drive seal-less design for leak-free operation
- Carbon fiber reinforced ETFE casing and impeller
- Silicon carbide bearings and shaft components
- PTFE gasket for enhanced chemical resistance
- Designed for aggressive chemical handling applications
- Dry-run resistant non-contact system design
- ANSI flanged connections for industrial installations
- Modular construction for simplified maintenance
- Suitable for high-purity and corrosive fluid transfer
- Less motor configuration for flexible motor pairing
Applications
- Chemical processing systems
- Acid and alkali transfer
- Chemical recirculation systems
- Industrial fluid handling
- Semiconductor chemical applications
- Corrosive liquid transfer
- Process manufacturing plants
- Water treatment chemical dosing
- Industrial circulation systems
- High-purity chemical processing
Specifications
- Manufacturer: Iwaki
- Model: MDM326EKK10
- Series: MDM Series
- Pump Type: Magnetic Drive Chemical Process Pump
- Configuration: Less Motor
- Casing Material: Carbon Fiber Reinforced ETFE
- Impeller Material: Carbon Fiber Reinforced ETFE
- Bearing Material: Silicon Carbide
- Shaft Material: Silicon Carbide
- Gasket Material: PTFE
- Connection Type: ANSI Flange
- Suction Port Size: 3 Inch
- Discharge Port Size: 2 Inch
- Maximum Flow Rate: Up to 350 GPM
- Maximum Head: Up to 176 Feet
- Motor Frame Size: 215TC
- Nominal Impeller Diameter: 6.7 Inch
- Pump Design: Seal-less Centrifugal Magnetic Drive
FAQs
What makes a magnetic drive pump different from a standard centrifugal pump?
A magnetic drive pump uses magnetic coupling technology instead of a mechanical shaft seal, helping reduce leakage risks and maintenance requirements in chemical processing environments.
Can the Iwaki MDM326EKK10 handle corrosive chemicals?
Yes. The ETFE construction and PTFE gasket materials are designed for excellent resistance to many aggressive and corrosive chemicals used in industrial applications.
Is the motor included with the MDM326EKK10 pump?
No. This model is supplied as a less motor configuration, allowing users to select a compatible motor for their system requirements.
What industries commonly use the MDM series pumps?
These pumps are commonly used in chemical manufacturing, semiconductor processing, water treatment, industrial processing, and fluid transfer operations.
Why are silicon carbide bearings used in this pump?
Silicon carbide components provide high wear resistance, durability, and compatibility with demanding chemical process applications.
Is the pump suitable for continuous-duty industrial operation?
Yes. The MDM series is engineered for continuous industrial service where reliable chemical transfer and process stability are required.
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